Exhibition Invitation | GMY to Showcase 172 nm Excimer Solutions at the 27th CIOE and IICIE

From September 9 to 11, 2026, the 27th China International Optoelectronic Exposition (CIOE), the International Integrated Circuit Innovation Expo (IICIE), and the 23rd elexcon Shenzhen International Electronics and Embedded Systems Expo will take place concurrently at the Shenzhen World Exhibition & Convention Center in Bao’an.

Together, the three exhibitions will provide an international platform for technology showcases, industry networking, and business collaboration.

GMY will be exhibiting at Booth 14C108, where we will showcase our range of 172 nm excimer products and UV technology solutions. We warmly invite partners and industry professionals to visit our booth and explore the applications of UV technology in semiconductor manufacturing, optoelectronic displays, pure-water treatment, and other fields.

Exhibit Preview：Advancing High-End Manufacturing with UV Technology

GMY’s 172 nm excimer light sources and modules deliver outstanding performance in applications including UV cleaning, UV curing, surface modification, and total organic carbon (TOC) reduction in pure-water treatment.

As a China-based manufacturer and supplier of 172 nm excimer light sources, GMY provides customers worldwide with core components, integrated modules, and customized solutions.

172 nm Excimer Light Sources

Our 172 nm excimer light sources combine high optical efficiency with narrowband emission, providing concentrated energy and stable output.

Their non-contact, low-temperature operation helps prevent heat-induced damage, making them suitable for the precision processing of heat-sensitive materials.

172 nm Excimer Modules

172 nm MINI Laboratory Module

Designed for semiconductor process development, process validation, and small-batch pilot production, the MINI Laboratory Module features a compact design, easy installation, flexible deployment, and cost-effective operation.

Wafer UV Cleaning Module

Designed specifically for wafer substrates, this module efficiently removes nanoscale organic contaminants. It helps improve yields in subsequent coating and bonding processes while ensuring process accuracy and stability.

High-Energy UV System

Designed for laboratory validation and application development, the High-Energy UV System helps shorten validation cycles and accelerate the transition from research to industrial application. It is suitable for UV cleaning, UV curing, surface modification, and related processes.

From September 9 to 11, visit GMY at Booth 14C108 at the Shenzhen World Exhibition & Convention Center in Bao’an.

We look forward to meeting you, learning about your requirements, and exploring how 172 nm excimer technology can support your manufacturing processes.