From June 4 to 6, the China (Shenzhen) International Semiconductor Exhibition will be held at the Shenzhen World Exhibition & Convention Center. GMY (Booth No. 14G22) will showcase a range of ultraviolet light sources, equipment, and modules, including its 172nm excimer light series. The focus will be on application solutions for 172nm excimer light in processes such as wafer surface photocleaning, semiconductor substrate surface activation, and ultrapure water TOC degradation.

We sincerely invite industry partners to visit and exchange ideas, jointly exploring the innovative applications of 172nm and other ultraviolet light technologies in semiconductor manufacturing, and working together to open a new chapter of cooperation.

Exhibition Information

2025 China (Shenzhen) International Semiconductor Exhibition

Date: June 4–6, 2025

Venue: Hall 14, Shenzhen World Exhibition & Convention Center

Booth No.: 14G22

Innovative 172nm Excimer Light Applications Supporting High-Efficiency, High-Quality Semiconductor Manufacturing

01.Wafer/Mask Photocleaning

Function: Efficiently removes various microscopic organic contaminants to achieve ultra-clean surfaces.

Advantages: No chemical residue, low-temperature and damage-free, atomic-level cleanliness.

Applications: Cleaning of organic surface contaminants, pre-packaging surface pretreatment, and photoresist removal for wafers, photomasks, reticles, displays, PET, PCBs, etc.

Application Effect: 172nm excimer light cleaning improves the cleanliness of nanoimprint molds.

02.Wafer Bonding Surface Modification

Function: Rapidly and precisely adjusts surface hydrophilicity and adhesion properties.

Advantages: No thermal effects, fast processing, no chemical residues.

Applications: High-precision chip manufacturing processes such as pretreatment before thin film deposition, MEMS packaging, 3D packaging, wafer bonding, flip-chip bonding, and wire bonding.

Application Effect: 172nm excimer light irradiation enhances material hydrophilicity, reducing the contact angle.

03.Ultrapure Water TOC Degradation

Function: Efficiently degrades total organic carbon (TOC) in ultrapure water, achieving ppb-level cleanliness.

Advantages: No chemical additives, online degradation, high efficiency, and stable performance.

Applications: Ultrapure water systems for semiconductor wafer processing and display panel production.

Technical Principle: 172nm ultraviolet light promotes the formation of free radicals in water, rapidly oxidizing organic compounds into CO₂ and H₂O, effectively degrading TOC.

We Sincerely Invite You to Visit and Explore New Industry Opportunities

With over 20 years of dedicated experience in lighting technology R&D and manufacturing, GMY focuses on the innovative applications of 172nm excimer light sources in semiconductor manufacturing processes. The company continues to deliver efficient, reliable, and cost-effective technical solutions to the industry.

Leveraging professional capabilities in pipeline equipment design and customization, GMY can provide core light source components, modules, and equipment required for high-end manufacturing processes such as semiconductors. These solutions cover the entire process chain from experimental verification to large-scale mass production, meeting the diverse production needs of different stages. Additionally, by relying on independently developed 172nm light source technology, GMY contributes to strengthening and stabilizing the semiconductor industry chain, enhancing domestic substitution capacity, and ensuring supply chain security and system stability.

At this exhibition, we look forward to engaging in in-depth, face-to-face exchanges with you, discussing the technical details and application experiences of 172nm excimer light in various semiconductor manufacturing processes, sharing industry insights, and supporting the ongoing optimization and advancement of semiconductor manufacturing technologies.

See you at International Semiconductor Exhibition 2025, June 4–6!