GMY 172nm High-Energy Light Cleaning Machine: Setting a New Standard in Surface Treatment Efficiency

As technology advances rapidly, the semiconductor industry is pivotal in modern manufacturing, encompassing computers, smartphones, and household appliances. However, semiconductor manufacturing processes are intricate and rigorous, where even minute contaminants or defects can significantly impact product yield and performance. Therefore, efficient and non-destructive cleaning technologies are essential in semiconductor production. GMY introduces the innovative 172nm high-energy photocleaning machine, offering a revolutionary cleaning solution for the semiconductor industry.

The GMY 172nm high-energy photocleaning machine utilizes powerful 172nm ultraviolet photons to break chemical bonds of organic molecules, decomposing them into smaller molecular radicals. Simultaneously, oxygen in the air absorbs these photons, generating reactive oxygen and ozone, which further decompose to produce additional reactive oxygen. Precise irradiation enables nanoscale modifications on substrate surfaces. This cleaning method not only efficiently removes surface organic contaminants but also preserves substrate integrity, achieving damage-free cleaning.

Key Features:

High-Energy Photocleaning: Uses a 172nm light source to effectively decompose dust, grease, and oil contaminants on substrates, ensuring precise cleaning and enhancing product yield.

Environmental Sustainability and Energy Efficiency: Avoids harmful chemicals and consumables, promoting eco-friendly cleaning and reducing energy consumption.

Technological Superiority: Utilizes quantum technology with high energy and low penetration, preventing electrostatic interference, enabling contactless operation, and preserving substrate mechanical properties.

Enhanced Efficiency: Accelerates substrate irradiation, reducing cleaning cycles and boosting production efficiency.

Automated Control: Ensures precision and repeatability in cleaning processes through computerized controls, streamlining operational workflows.

Uniform Radiation: Maintains excellent uniformity across the irradiation area with consistent intensity output, ensuring continuous stable cleaning processes.

Customization: Tailors irradiation platforms of varying sizes and equipment with different intensities and powers to meet diverse substrate and application requirements.

Applications Outlook:

GMY's 172nm high-energy photocleaning machine excels not only in semiconductor manufacturing but also shows significant potential in other high-precision fields.

GMY focuses on research and development of light technology applications, with a dedicated R&D team actively exploring diverse applications of 172nm photocleaning technology. We provide innovative and reliable light technology solutions for industries such as semiconductors and precision manufacturing, aiming to enhance production efficiency, improve product quality, and promote high-quality enterprise development.