On September 10, the Shenzhen International Semiconductor Exhibition & 2025 Integrated Circuit Industry Innovation Expo (SEMI-e) commenced at the Shenzhen World Exhibition & Convention Center (Baoan). GMY (Booth: 13G27) featured its 172nm excimer light application solutions and a range of innovative products, attracting significant interest from industry professionals.

The showcased 172nm excimer lamp solutions are designed for critical processes and R&D in advanced manufacturing such as semiconductors, including photocleaning, photocuring, photomodification, and ultrapure water TOC reduction. These technologies offer precise, eco-friendly alternatives that enhance process performance and support sustainable manufacturing practices.

Wafer/Mask Photocleaning Solution:

Efficiently removes micro-scale organic contaminants from wafers and masks, delivering atomic-level cleanliness without chemical residues, low-temperature operation, or substrate damage.

Wafer Bonding Modification Solution:

Improves bonding quality by precisely controlling surface hydrophilicity and adhesion. Ensures fast processing, minimal heat impact, and a chemical-free process.

Ultrapure Water TOC Reduction Solution:

Effectively breaks down total organic carbon (TOC) in ultrapure water systems, achieving ppb-level purity without chemical additives. Supports continuous online operation with high reliability.

Process Development and Validation Solution:

The compact and portable 172nm MINI module is ideal for process development, verification, and low-volume pilot production. It is easy to deploy and adaptable to diverse R&D environments.

Throughout the event, the GMY team held in-depth discussions with visitors, explaining the technical advantages and practical benefits of each solution, which were well received.

SEMI-e Shenzhen runs until September 12. GMY welcomes all attendees to visit Booth 13G27 to explore applications and developments in 172nm excimer light technology for the semiconductor industry and beyond.