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The 172nm ultraviolet photocleaning solution leverages the photorecombination effect of organic compounds to remove organic materials adhered to surfaces. After photocleaning, the surface achieves "atomic cleanliness."
Applications
Cleaning of materials such as display substrates, semiconductor silicon wafers, integrated circuits, optical devices, LCDs, electronic paper, AR lenses, and micro-nano manufacturing.
Key Features
Mercury-Free Operation
Highly Energetic Photons Generate Hydroxyl Radicals (HO*)
Consistent Quality and Reliable Delivery with Large Production Capacity
Customizable Lamp Design for Flexible Application
| Model | Power | Size | Emission Length | Product Code |
| 172E860D40×957 | 860W | φ40*957mm | 860mm | A520121 4001000 |
| 172E172D26.5×908 | 172W | φ26.5*908mm | 842mm | A5201215001000 |
The 172nm ultraviolet photocleaning solution leverages the photorecombination effect of organic compounds to remove organic materials adhered to surfaces. After photocleaning, the surface achieves "atomic cleanliness."
Applications
Cleaning of materials such as display substrates, semiconductor silicon wafers, integrated circuits, optical devices, LCDs, electronic paper, AR lenses, and micro-nano manufacturing.
Key Features
Mercury-Free Operation
Highly Energetic Photons Generate Hydroxyl Radicals (HO*)
Consistent Quality and Reliable Delivery with Large Production Capacity
Customizable Lamp Design for Flexible Application
| Model | Power | Size | Emission Length | Product Code |
| 172E860D40×957 | 860W | φ40*957mm | 860mm | A520121 4001000 |
| 172E172D26.5×908 | 172W | φ26.5*908mm | 842mm | A5201215001000 |
