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This module is specially designed for photocleaning of film substrates (such as PI and PET). It efficiently removes nanoscale organic contaminants and improves the yield of subsequent coating/lamination processes.
Key Features：
High-Intensity Output: The 172nm UV light delivers a central irradiance exceeding 70 mW/cm² (@3mm), ensuring efficient decomposition of surface organic contaminants.
Long Service Life: Through the use of premium electrode materials and precise gas composition control, the light achieves a service life of over 2,500 hours, reducing maintenance frequency and operating costs.
Excellent Uniformity: Special optical structure design enables a large irradiation window of 350×350mm, with irradiance uniformity reaching ±10%.
Instant Operation: No preheating is required, supporting rapid start-up and high-frequency, high-voltage pulse driving, suitable for roll-to-roll continuous production processes.
High Adaptability: Operates reliably within a temperature range of -5°C to 30°C, ideal for cleanroom and temperature-controlled environments.
Flexible Integration: Compatible with various web production equipment, allowing easy integration into existing or newly built production lines to meet different application requirements.
Mercury-Free Light Source: Utilizes a 172nm mercury-free UV light source, ensuring safety and environmental protection.
Professional and Reliable: Supported by years of experience in 172nm light source and equipment manufacturing, with large-scale production capability, high product consistency, stable performance, and reliable, on-time delivery.
Specifications:
Model: MO-D330-6
Input Voltage: AC 110~240V
Total Power: 1200W ±10%
Average Service Life (Irradiance ≥70%): 2,500 hrs
172nm Central Irradiance: >70 mW/cm² (@3mm working distance)
Operating Temperature: -5°C~30°C
Operating Humidity: 20%~80%
Uniformity: ±10% (350×350mm irradiation window)
Applications：
Nanometer-scale surface photocleaning of film substrates
UV ink and photosensitive adhesive curing
Surface modification and activation
Manufacturing processes for flexible displays, semiconductors, and optical films
This module is specially designed for photocleaning of film substrates (such as PI and PET). It efficiently removes nanoscale organic contaminants and improves the yield of subsequent coating/lamination processes.
Key Features：
High-Intensity Output: The 172nm UV light delivers a central irradiance exceeding 70 mW/cm² (@3mm), ensuring efficient decomposition of surface organic contaminants.
Long Service Life: Through the use of premium electrode materials and precise gas composition control, the light achieves a service life of over 2,500 hours, reducing maintenance frequency and operating costs.
Excellent Uniformity: Special optical structure design enables a large irradiation window of 350×350mm, with irradiance uniformity reaching ±10%.
Instant Operation: No preheating is required, supporting rapid start-up and high-frequency, high-voltage pulse driving, suitable for roll-to-roll continuous production processes.
High Adaptability: Operates reliably within a temperature range of -5°C to 30°C, ideal for cleanroom and temperature-controlled environments.
Flexible Integration: Compatible with various web production equipment, allowing easy integration into existing or newly built production lines to meet different application requirements.
Mercury-Free Light Source: Utilizes a 172nm mercury-free UV light source, ensuring safety and environmental protection.
Professional and Reliable: Supported by years of experience in 172nm light source and equipment manufacturing, with large-scale production capability, high product consistency, stable performance, and reliable, on-time delivery.
Specifications:
Model: MO-D330-6
Input Voltage: AC 110~240V
Total Power: 1200W ±10%
Average Service Life (Irradiance ≥70%): 2,500 hrs
172nm Central Irradiance: >70 mW/cm² (@3mm working distance)
Operating Temperature: -5°C~30°C
Operating Humidity: 20%~80%
Uniformity: ±10% (350×350mm irradiation window)
Applications：
Nanometer-scale surface photocleaning of film substrates
UV ink and photosensitive adhesive curing
Surface modification and activation
Manufacturing processes for flexible displays, semiconductors, and optical films
