GMY is a professional 172nm excimer light application solution provider, offering fully customized application solutions and contract experimental services for various applications, including photocleaning, surface modification, and UV curing. We support customers in efficiently advancing their process R&D and validation projects.
The 172nm MINI Excimer Experimental Module is specifically designed for semiconductor process R&D, process validation, and small-batch pilot production. Featuring a highly integrated and lightweight design, the module is about the size of a book, with a compact structure and excellent cost-performance ratio. It is plug-and-play, easy to carry, and effortlessly adapts to various experimental environments. Ideal for universities, enterprises, and research institutes, it enables efficient setup of excimer light experimental platforms and is widely applied in multiple fields, including flat panel display photocleaning and plastic surface modification.
GMY's 172nm UV light cleaning technology is based on the principle of photochemical oxidation. By irradiating the organic material's surface with UV light, it generates free radicals, oxidizing organics into water and carbon dioxide, effectively removing surface contaminants.
GMY's 172nm UV oxidation technology adopts a mercury-free UV light source to efficiently generate free radicals that rapidly oxidize organic compounds in water into CO2 and H2O, significantly reducing TOC (Total Organic Carbon) to ppb levels. This module is specially developed for ultrapure water systems, suitable for applications in semiconductors, pharmaceuticals, biopharmaceuticals, precision electronics, and biochemical laboratories. Featuring a modular structure design, it facilitates maintenance, replacement, and system expansion, and can be customized for different power levels and flow rates as required.
The 172nm UV (PET) Photocleaning Module is specifically designed for the removal of nanometer-scale organic contaminants from the surfaces of film substrates such as PI and PET. Utilizing the high-energy photons of 172nm VUV light, it effectively eliminates residual organic impurities, thereby improving the yield of subsequent processes including vacuum coating, lamination, and coating applications. It is widely used in industries such as optoelectronics, flexible displays, semiconductors, optical films, and electronic device manufacturing, particularly suitable for surface treatment processes requiring high cleanliness and strong adhesion.
The 172nm High-Energy UV Device is utilized for the high-energy decomposition and cleaning of organic particles on the surface of metal materials or silicon-based materials to enhance the performance of semiconductors or batteries. This machine uses high-energy 172nm UV photons to break the chemical bonds of organic molecules, decomposing them into smaller molecules or atoms. Concurrently, 172nm UV photons react with oxygen in the air to form reactive oxygen and ozone, which further decompose to produce more reactive oxygen. These reactive oxygen molecules react with the decomposed organic molecules through oxidation, creating oxides that volatilize, thus completing the surface cleaning. The 172nm high-energy photo-cleaning machine can efficiently remove surface organic contaminants without causing damage to the substrate surface, achieving non-destructive cleaning. In addition, by precisely controlling the intensity, 172nm excimer light can also complete nano-level modification of the substrate surface and material's surface curing.
GMY 172nm Photomodification Module, designed specifically for dental implant activation hydrophilic devices, is mainly used for surface modification of materials in a vacuum environment. This module effectively activates the hydrophilicity of the implant surface through 172nm excimer photocatalytic technology and removes hydrocarbons from the titanium metal surface, thereby enhancing the bioactivity of TiO2. GMY 172nm Photomodification Module has advantages such as high energy density, low reaction temperature, short reaction time, and large and uniform coverage area.
GMY provides innovative 172nm excimer lamp technology for the efficient degradation and reduction of total organic carbon (TOC) in water. By generating free radicals, our UV light systems oxidize organic matter into CO₂ and H₂O molecules. This advanced technology is particularly suitable for ultra-pure water production.
GMY's 172nm excimer light curing technology harnesses high-energy 172nm UV light for rapid material curing with precise surface control. Compared to traditional UV curing, it shortens curing time and enhances surface modification effects.
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