GMY 172nm Photomodification Module, designed specifically for dental implant activation hydrophilic devices, is mainly used for surface modification of materials in a vacuum environment. This module effectively activates the hydrophilicity of the implant surface through 172nm excimer photocatalytic technology and removes hydrocarbons from the titanium metal surface, thereby enhancing the bioactivity of TiO2. GMY 172nm Photomodification Module has advantages such as high energy density, low reaction temperature, short reaction time, and large and uniform coverage area.
GMY's 172nm UV light cleaning technology is based on the principle of photochemical oxidation. By irradiating the organic material's surface with UV light, it generates free radicals, oxidizing organics into water and carbon dioxide, effectively removing surface contaminants.
GMY's 172nm excimer light curing technology harnesses high-energy 172nm UV light for rapid material curing with precise surface control. Compared to traditional UV curing, it shortens curing time and enhances surface modification effects.
GMY provides innovative 172nm excimer lamp technology for the efficient degradation and reduction of total organic carbon (TOC) in water. By generating free radicals, our UV light systems oxidize organic matter into CO₂ and H₂O molecules. This advanced technology is particularly suitable for ultra-pure water production.
The 172nm High-Energy UV Device is utilized for the high-energy decomposition and cleaning of organic particles on the surface of metal materials or silicon-based materials to enhance the performance of semiconductors or batteries. This machine uses high-energy 172nm UV photons to break the chemical bonds of organic molecules, decomposing them into smaller molecules or atoms. Concurrently, 172nm UV photons react with oxygen in the air to form reactive oxygen and ozone, which further decompose to produce more reactive oxygen. These reactive oxygen molecules react with the decomposed organic molecules through oxidation, creating oxides that volatilize, thus completing the surface cleaning. The 172nm high-energy photo-cleaning machine can efficiently remove surface organic contaminants without causing damage to the substrate surface, achieving non-destructive cleaning. In addition, by precisely controlling the intensity, 172nm excimer light can also complete nano-level modification of the substrate surface and material's surface curing.
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